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Background
This
project focuses on the chemical bonding and interface formation of
metal fission products with the coating materials used in
tri-isotropic (TRISO) fuel particles for gas-cooled reactors. By
combining surface- and bulk-sensitive spectroscopic methods,
intermediate chemical phases at the interface, intermixing/diffusion
behavior, and the electronic interface structure as a function of
material (metal and coating materials) and temperature are examined.
In
detail, the project studies the interface formation of Pd, Cs, and
Ag with SiC and pyrolytic carbon. Using SiC single crystals as
substrates, interfaces are prepared under controlled conditions in
an ultra-high vacuum environment and are studied with a combination
of experimental methods, including Photoelectron Spectroscopy, Auger
Electron Spectroscopy, Inverse Photoemission, X-Ray Emission
Spectroscopy, and X-Ray Absorption Spectroscopy. Furthermore,
microscopic techniques (Transmission Electron Microscopy, Scanning
Tunneling Microscopy, Atomic Force Microscopy) and local scanning
tunneling spectroscopy are being employed.
XPS
survey spectra of an HF-etched SiC single crystal surface, after
heat treatment at approximately 400°C,
and after various deposition steps of Cs (given is the deposition
time in seconds).
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Research
Objectives and Methods
By combining results
for the electronic and chemical structure of the fission product/TRISO
layer interfaces, the research results give information about
failure mechanisms of TRISO particles and fission product transport.
Furthermore, they can
be used to derive strategies to tailor the interface properties for
an optimization of TRISO particles in terms of, e.g., chemical and
long-term stability.
The experiments use two
different experimental set-ups. First, a multi-chamber ultra-high
vacuum system at UNLV (see photo in the 2005-2006 Annual Report)
houses the majority of surface-sensitive methods. Second, the soft
X-ray fluorescence (SXF) endstation at Beamline 8.0 at the Advanced
Light Source, Lawrence Berkeley National Lab is used to perform
X-ray absorption and emission spectroscopy. The apparatus at UNLV
consists of a surface spectroscopy chamber, a preparation chamber,
and a ultra-high vacuum scanning probe microscope. Samples can be
introduced into the machine through a glove box with integrated
load-lock and then transferred to each of the chambers via a
distribution chamber. The analysis chamber is equipped with a
state-of-the-art electron analyzer, an X-ray source, an ultraviolet
(UV) source, and an inverse photoemission setup consisting of a
low-energy high-flux electron gun and a UV detector. The preparation
chamber is used for cleaning samples with an ion source and for the
deposition of metal films with an evaporator.
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